Laser-cooled ion source

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Abstract

Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and imaging applications. In particular it is used for quality control of wafers, by using a combination of a FIB and an electron microscope to make cross-sectional inspections of wafers. In addition, FIB's are used for mask repair through gas-assisted etching.
Original languageEnglish
Title of host publicationProceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece
EditorsD. Charalambidis, S. Farantos, P. Lambroulos
PublisherEuropean Physical Society (EPS)
Pagesm02-06-
Publication statusPublished - 2007
Eventconference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11 -
Duration: 6 May 200711 May 2007

Conference

Conferenceconference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11
Period6/05/0711/05/07
OtherECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007

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    Reijnders, M. P., Geer, van der, S. B., Taban, G., Luiten, O. J., Mutsaers, P. H. A., & Vredenbregt, E. J. D. (2007). Laser-cooled ion source. In D. Charalambidis, S. Farantos, & P. Lambroulos (Eds.), Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece (pp. m02-06-). European Physical Society (EPS).