Laser-cooled ion source

M.P. Reijnders; S.B. Geer, van der; G. Taban; O.J. Luiten; P.H.A. Mutsaers; E.J.D. Vredenbregt

Laser-cooled ion source

M.P. Reijnders, S.B. Geer, van der, G. Taban, O.J. Luiten, P.H.A. Mutsaers, E.J.D. Vredenbregt

Coherence and Quantum Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

34 Downloads (Pure)

Abstract

Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and imaging applications. In particular it is used for quality control of wafers, by using a combination of a FIB and an electron microscope to make cross-sectional inspections of wafers. In addition, FIB's are used for mask repair through gas-assisted etching.

Original language	English
Title of host publication	Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece
Editors	D. Charalambidis, S. Farantos, P. Lambroulos
Publisher	European Physical Society (EPS)
Pages	m02-06-
Publication status	Published - 2007
Event	conference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11 - Duration: 6 May 2007 → 11 May 2007

Conference

Conference	conference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11
Period	6/05/07 → 11/05/07
Other	ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007

Access to Document

Metis212715Final published version, 41.6 KB

Cite this

@inproceedings{7887cfd1d11346679fbe1b87b466f0c5,

title = "Laser-cooled ion source",

abstract = "Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and imaging applications. In particular it is used for quality control of wafers, by using a combination of a FIB and an electron microscope to make cross-sectional inspections of wafers. In addition, FIB's are used for mask repair through gas-assisted etching.",

author = "M.P. Reijnders and {Geer, van der}, S.B. and G. Taban and O.J. Luiten and P.H.A. Mutsaers and E.J.D. Vredenbregt",

year = "2007",

language = "English",

pages = "m02--06--",

editor = "D. Charalambidis and S. Farantos and P. Lambroulos",

booktitle = "Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece",

publisher = "European Physical Society (EPS)",

note = "conference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11 ; Conference date: 06-05-2007 Through 11-05-2007",

}

Reijnders, MP, Geer, van der, SB, Taban, G, Luiten, OJ , Mutsaers, PHA & Vredenbregt, EJD 2007, Laser-cooled ion source. in D Charalambidis, S Farantos & P Lambroulos (eds), Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece. European Physical Society (EPS), pp. m02-06-, conference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11, 6/05/07.

Laser-cooled ion source. / Reijnders, M.P.; Geer, van der, S.B.; Taban, G. et al.

Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece. ed. / D. Charalambidis; S. Farantos; P. Lambroulos. European Physical Society (EPS), 2007. p. m02-06-.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Laser-cooled ion source

AU - Reijnders, M.P.

AU - Geer, van der, S.B.

AU - Taban, G.

AU - Luiten, O.J.

AU - Mutsaers, P.H.A.

AU - Vredenbregt, E.J.D.

PY - 2007

Y1 - 2007

N2 - Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and imaging applications. In particular it is used for quality control of wafers, by using a combination of a FIB and an electron microscope to make cross-sectional inspections of wafers. In addition, FIB's are used for mask repair through gas-assisted etching.

AB - Focused Ion Beams (FIB) are widely used in the semiconductor industry for milling, sputtering and imaging applications. In particular it is used for quality control of wafers, by using a combination of a FIB and an electron microscope to make cross-sectional inspections of wafers. In addition, FIB's are used for mask repair through gas-assisted etching.

M3 - Conference contribution

SP - m02-06-

BT - Proceedings of the 9th European conference on atoms molecules and photons (ECAMP 9), 6-11 May 2007, Heraklion, Greece

A2 - Charalambidis, D.

A2 - Farantos, S.

A2 - Lambroulos, P.

PB - European Physical Society (EPS)

T2 - conference; ECAMP : European conference on atoms molecules and photons ; 9 Greece, Heraklion, 6-11 May 2007; 2007-05-06; 2007-05-11

Y2 - 6 May 2007 through 11 May 2007

ER -

Laser-cooled ion source

Abstract

Conference

Access to Document

Fingerprint

Cite this