Laser-assisted wafer processing: new perspectives in through-substrate via drilling and redistribution layer deposition

M.B. Hoppenbrouwers, G. Oosterhuis, G. Knippels, F. Roozeboom

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

Original languageEnglish
Title of host publication3D Process Technology
PublisherWiley-Blackwell
Pages121-134
Number of pages14
Volume3
ISBN (Electronic)9783527670109
ISBN (Print)9783527334667
DOIs
Publication statusPublished - 21 Jul 2014

Keywords

  • Direct-write deposition
  • Drilling
  • Laser drilling of TSVs
  • Laser-induced forward transfer
  • Laser-induced RDL deposition
  • Redistribution layers
  • Through-substrate vias
  • Wafer processing

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