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Kinetic study of the chemical vapor deposition of tin oxidereactor design, "Coatings on Glass 1998"

  • A.M.B. Mol, van
  • , G.R. Alcott
  • , M.H.J.M. Croon, de
  • , C.I.M.A. Spee
  • , J.C. Schouten

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass.
Original languageEnglish
Title of host publicationSelected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6 - 10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications]
EditorsH. Pulker, H. Schmidt, M.A. Aegerter
Place of PublicationAmsterdam
PublisherElsevier
Pages178-180
Publication statusPublished - 1999
Eventconference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 -
Duration: 6 Sept 19989 Sept 1998

Conference

Conferenceconference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09
Period6/09/989/09/98
OtherInternational Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10

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