Abstract
Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass.
| Original language | English |
|---|---|
| Title of host publication | Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6 - 10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications] |
| Editors | H. Pulker, H. Schmidt, M.A. Aegerter |
| Place of Publication | Amsterdam |
| Publisher | Elsevier |
| Pages | 178-180 |
| Publication status | Published - 1999 |
| Event | conference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 - Duration: 6 Sept 1998 → 9 Sept 1998 |
Conference
| Conference | conference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 |
|---|---|
| Period | 6/09/98 → 9/09/98 |
| Other | International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10 |
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