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Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3
Nicholas Chittock, Martijn F.J. Vos, Tahsin Faraz, W.M.M. Kessels, Harm C.M. Knoops, Adriaan J.M. Mackus (Corresponding author)
Research output: Contribution to journal › Article › Academic › peer-review