TY - JOUR
T1 - Ionization efficiency in a geometrically pinched cascaded arc
AU - Burm, K.T.A.L.
AU - Goedheer, W.J.
AU - Mullen, van der, J.J.A.M.
AU - Janssen, G.M.
AU - Schram, D.C.
PY - 1998
Y1 - 1998
N2 - Remote deposition allows separate optimization of the plasma production source and of the deposition process. To improve the ionization performance of the source, an argon cascaded arc plasma is studied by simulations. Improvements of the source performance in ion yield are achieved by constricting the bore of the arc channel near the entrance. Such a geometrical pinch construction leads to a higher neutral density at the arc inlet which results in increased ionization in the cascaded arc. The improved ionization performance is analysed by solving numerically the conservation laws of mass, momentum and energy in a two-dimensional hydrodynamic approximation using a pressure linked algorithm. The results are compared with those of a simplified one-dimensional formulation in order to identify the main mechanisms. The results indicate that, by constricting the bore of the arc channel, a very high ionization degree can be obtained.
AB - Remote deposition allows separate optimization of the plasma production source and of the deposition process. To improve the ionization performance of the source, an argon cascaded arc plasma is studied by simulations. Improvements of the source performance in ion yield are achieved by constricting the bore of the arc channel near the entrance. Such a geometrical pinch construction leads to a higher neutral density at the arc inlet which results in increased ionization in the cascaded arc. The improved ionization performance is analysed by solving numerically the conservation laws of mass, momentum and energy in a two-dimensional hydrodynamic approximation using a pressure linked algorithm. The results are compared with those of a simplified one-dimensional formulation in order to identify the main mechanisms. The results indicate that, by constricting the bore of the arc channel, a very high ionization degree can be obtained.
U2 - 10.1088/0963-0252/7/3/018
DO - 10.1088/0963-0252/7/3/018
M3 - Article
SN - 0963-0252
VL - 7
SP - 395
EP - 409
JO - Plasma Sources Science and Technology
JF - Plasma Sources Science and Technology
ER -