Ion-radical synergy in HfO2 etching studied in a beam experiment

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Abstract

Abstract only.

Original language	English
Title of host publication	AVS 53rd International Symposium, Moscone West, San Francisco, CA, USA, November 12-17, 2006
Publication status	Published - 2006
Event	53rd International Symposium of the American Vacuum Society - San Francisco, United States Duration: 12 Nov 2006 → 17 Nov 2006

Conference	53rd International Symposium of the American Vacuum Society
Abbreviated title	AVS 53
Country/Territory	United States
City	San Francisco
Period	12/11/06 → 17/11/06

@inproceedings{f303b8b47461484392357d9eb7cf3371,

title = "Ion-radical synergy in HfO2 etching studied in a beam experiment",

abstract = "Abstract only.",

author = "P.M. Gevers and H.C.W. Beijerinck and \{Sanden, van de\}, M.C.M. and W.M.M. Kessels",

year = "2006",

language = "English",

booktitle = "AVS 53rd International Symposium, Moscone West, San Francisco, CA, USA, November 12-17, 2006",

note = "53rd International Symposium of the American Vacuum Society, AVS 53 ; Conference date: 12-11-2006 Through 17-11-2006",

}

TY - GEN

T1 - Ion-radical synergy in HfO2 etching studied in a beam experiment

AU - Gevers, P.M.

AU - Beijerinck, H.C.W.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2006

Y1 - 2006

N2 - Abstract only.

AB - Abstract only.

M3 - Conference contribution

BT - AVS 53rd International Symposium, Moscone West, San Francisco, CA, USA, November 12-17, 2006

T2 - 53rd International Symposium of the American Vacuum Society

Y2 - 12 November 2006 through 17 November 2006

ER -