Ion-radical synergy in HfO2 etching studied in a beam experiment

P.M. Gevers, H.C.W. Beijerinck, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationPlasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book
Place of PublicationS.l.
Publication statusPublished - 2007

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