Ion-radical synergy in HfO2 etching studied in a beam experiment

P.M. Gevers; H.C.W. Beijerinck; M.C.M. Sanden, van de; W.M.M. Kessels

Ion-radical synergy in HfO2 etching studied in a beam experiment

P.M. Gevers, H.C.W. Beijerinck, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book
Place of Publication	S.l.
Publisher	s.n.
Publication status	Published - 2007

Cite this

@inproceedings{24fe6a340913436bbe04296b19e40885,

title = "Ion-radical synergy in HfO2 etching studied in a beam experiment",

author = "P.M. Gevers and H.C.W. Beijerinck and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2007",

language = "English",

booktitle = "Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book",

publisher = "s.n.",

}

Ion-radical synergy in HfO2 etching studied in a beam experiment. / Gevers, P.M.; Beijerinck, H.C.W.; Sanden, van de, M.C.M. et al.

Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book. S.l. : s.n., 2007.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Ion-radical synergy in HfO2 etching studied in a beam experiment

AU - Gevers, P.M.

AU - Beijerinck, H.C.W.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2007

Y1 - 2007

M3 - Conference contribution

BT - Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book

PB - s.n.

CY - S.l.

ER -