Ion mitigation in SN-based EUV sources using a magnetic field

W.J. Soer, K. Gielissen, M.W. Herpen, van, M. Jak, V.Y. Banine

Research output: Contribution to conferencePoster

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Abstract

No abstract.
Original languageEnglish
Pages25-
Publication statusPublished - 2008

Bibliographical note

Poster presented at the International Symposium on Extreme Ultraviolet Lithography 2008 (2008 EUV Symposium), 28 September-1 October 2008, Lake Tahoe, USA

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