Ion flux measurements in a remote high rate depositing plasma using a pulse shape capacitive probe

M.C. Petcu; A.C. Bronneberg; M.A. Blauw; M. Creatore; M.C.M. Sanden, van de

Ion flux measurements in a remote high rate depositing plasma using a pulse shape capacitive probe

M.C. Petcu, A.C. Bronneberg, M.A. Blauw, M. Creatore, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

The application of a pulse shape biasing method implemented to a capacitive probe for the detn. of the ion flux in depositing plasmas is here described. To check the reliability of the method, conventional Langmuir probe and capacitive probe measurements on the same plasma mixts. are compared. The results show a good agreement between the two techniques. The capacitive probe is able to perform spatially-resolved ion flux measurements under high rate depositing conditions (2-20 nm/s), proving its tolerance to insulating layers. The measurements are performed in a remote expanding thermal plasma (ETP) reactor employing Ar as carrier gas and NH3 and SiH4 as deposition precursors.

Original language	English
Title of host publication	Annual Technical Conference Proceedings - Society of Vacuum Coaters, 51st
Pages	593-597
Publication status	Published - 2008

Cite this

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title = "Ion flux measurements in a remote high rate depositing plasma using a pulse shape capacitive probe",

abstract = "The application of a pulse shape biasing method implemented to a capacitive probe for the detn. of the ion flux in depositing plasmas is here described. To check the reliability of the method, conventional Langmuir probe and capacitive probe measurements on the same plasma mixts. are compared. The results show a good agreement between the two techniques. The capacitive probe is able to perform spatially-resolved ion flux measurements under high rate depositing conditions (2-20 nm/s), proving its tolerance to insulating layers. The measurements are performed in a remote expanding thermal plasma (ETP) reactor employing Ar as carrier gas and NH3 and SiH4 as deposition precursors.",

author = "M.C. Petcu and A.C. Bronneberg and M.A. Blauw and M. Creatore and {Sanden, van de}, M.C.M.",

year = "2008",

language = "English",

pages = "593--597",

booktitle = "Annual Technical Conference Proceedings - Society of Vacuum Coaters, 51st",

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T1 - Ion flux measurements in a remote high rate depositing plasma using a pulse shape capacitive probe

AU - Petcu, M.C.

AU - Bronneberg, A.C.

AU - Blauw, M.A.

AU - Creatore, M.

AU - Sanden, van de, M.C.M.

PY - 2008

Y1 - 2008

N2 - The application of a pulse shape biasing method implemented to a capacitive probe for the detn. of the ion flux in depositing plasmas is here described. To check the reliability of the method, conventional Langmuir probe and capacitive probe measurements on the same plasma mixts. are compared. The results show a good agreement between the two techniques. The capacitive probe is able to perform spatially-resolved ion flux measurements under high rate depositing conditions (2-20 nm/s), proving its tolerance to insulating layers. The measurements are performed in a remote expanding thermal plasma (ETP) reactor employing Ar as carrier gas and NH3 and SiH4 as deposition precursors.

AB - The application of a pulse shape biasing method implemented to a capacitive probe for the detn. of the ion flux in depositing plasmas is here described. To check the reliability of the method, conventional Langmuir probe and capacitive probe measurements on the same plasma mixts. are compared. The results show a good agreement between the two techniques. The capacitive probe is able to perform spatially-resolved ion flux measurements under high rate depositing conditions (2-20 nm/s), proving its tolerance to insulating layers. The measurements are performed in a remote expanding thermal plasma (ETP) reactor employing Ar as carrier gas and NH3 and SiH4 as deposition precursors.

M3 - Conference contribution

SP - 593

EP - 597

BT - Annual Technical Conference Proceedings - Society of Vacuum Coaters, 51st

ER -

Ion flux measurements in a remote high rate depositing plasma using a pulse shape capacitive probe

Abstract

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