Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films

Y.J. Bellouard; A.H. Dietzel; W.H. Bruenger; X. Wang; J.J. Vlassak

Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films

Y.J. Bellouard, A.H. Dietzel, W.H. Bruenger, X. Wang, J.J. Vlassak

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.

Original language	English
Title of host publication	Proceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA
Editors	B. Berg, M.R. Mitchell, J. Proft
Place of Publication	Ohio
Publisher	ASM International
Pages	381-390
ISBN (Print)	0-87170-862-0
Publication status	Published - 2008

Cite this

@inproceedings{f1cfd0531128497a99b5de67158d3f26,

title = "Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films",

abstract = "Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.",

author = "Y.J. Bellouard and A.H. Dietzel and W.H. Bruenger and X. Wang and J.J. Vlassak",

year = "2008",

language = "English",

isbn = "0-87170-862-0",

pages = "381--390",

editor = "B. Berg and M.R. Mitchell and J. Proft",

booktitle = "Proceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA",

publisher = "ASM International",

address = "United States",

}

Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films. / Bellouard, Y.J.; Dietzel, A.H.; Bruenger, W.H. et al.
Proceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA. ed. / B. Berg; M.R. Mitchell; J. Proft. Ohio: ASM International, 2008. p. 381-390.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films

AU - Bellouard, Y.J.

AU - Dietzel, A.H.

AU - Bruenger, W.H.

AU - Wang, X.

AU - Vlassak, J.J.

PY - 2008

Y1 - 2008

N2 - Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.

AB - Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.

M3 - Conference contribution

SN - 0-87170-862-0

SP - 381

EP - 390

BT - Proceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA

A2 - Berg, B.

A2 - Mitchell, M.R.

A2 - Proft, J.

PB - ASM International

CY - Ohio

ER -

Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films

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