Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.
|Title of host publication||Proceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA|
|Editors||B. Berg, M.R. Mitchell, J. Proft|
|Place of Publication||Ohio|
|Publication status||Published - 2008|