Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films

Y.J. Bellouard, A.H. Dietzel, W.H. Bruenger, X. Wang, J.J. Vlassak

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

Abstract

Ion beam projection techniques consist of using an ion beam with a pattern defined by a stencil mask. Features sizes can be below 100 nm. A variety of ions such as Ar, He, or Xe and a wide range of energies are available depending on the desired penetration depth and structural modification.In this paper, we explore the use of ion beam projection to locally modify annealed Ni-Ti thin films by inducing intermixing between an annealed sputter-deposited sub-micron Ni-Ti film and a Ni layer deposited on top. The objective is to alter the composition and transition temperatures of the Ni-Tiaccording to a pattern defined by the stencil mask. We report preliminary experimental results as well as a simulation of the intermixing process.
Original languageEnglish
Title of host publicationProceedings of Shape Memory and Superelastic Technologies (SMST-2006), 7-11 May 2006,Pacific Grove, California, USA
EditorsB. Berg, M.R. Mitchell, J. Proft
Place of PublicationOhio
PublisherASM International
Pages381-390
ISBN (Print)0-87170-862-0
Publication statusPublished - 2008

Fingerprint Dive into the research topics of 'Ion beam projection techniques for locally inducing intermixing in Ni-ti thin films'. Together they form a unique fingerprint.

Cite this