Investigation of Rb+milling rates using an ultracold focused ion beam

S. Xu; Y. Li; E.J.D. Vredenbregt

doi:10.1116/6.0001838

Investigation of Rb⁺milling rates using an ultracold focused ion beam

S. Xu
, Y. Li
, E.J.D. Vredenbregt (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

7 Citations (Scopus)

168 Downloads (Pure)

Abstract

Several ion source alternatives for current focused ion beam (FIB) systems have been studied to achieve higher brightness, including cold atom ion sources. However, a study of ultracold ions interacting with often used materials is seldom reported. Here, we investigate milling on several typical samples in a prototype ultracold Rb FIB system at 8.5 keV beam energy. For polycrystalline metallic substrates, such as Cu and Au, patterns milled by Rb + ions are observed to have reduced surface roughness but still high milling rates compared with those milled by Ga + ions. Rb + also shows similar sputter rates as 30 keV Ga + on semiconductor substrates GaAs and InP. Special cases for Rb + milling show that the Rb + ion beam has a 2.6 × faster sputter rate on diamond but a 3 × slower sputter rate on Al compared with a normal 30 keV Ga + ion beam. In general, an Rb + ion beam is shown to be suitable for nanostructuring of several basic materials.

Original language	English
Article number	042801
Number of pages	7
Journal	Journal of Vacuum Science and Technology B
Volume	40
Issue number	4
DOIs	https://doi.org/10.1116/6.0001838
Publication status	Published - 1 Jul 2022

Bibliographical note

Funding Information:
This work is part of the project Next-Generation Focused Ion Beam (No. NWO-TTW16178) of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO). The authors would like to acknowledge helpful discussions with Greg Schwind, Chad Rue, Erik Kieft, and Yuval Greenzweig.

Funding

This work is part of the project Next-Generation Focused Ion Beam (No. NWO-TTW16178) of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO). The authors would like to acknowledge helpful discussions with Greg Schwind, Chad Rue, Erik Kieft, and Yuval Greenzweig.

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10.1116/6.0001838

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Cite this

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title = "Investigation of Rb+milling rates using an ultracold focused ion beam",

abstract = "Several ion source alternatives for current focused ion beam (FIB) systems have been studied to achieve higher brightness, including cold atom ion sources. However, a study of ultracold ions interacting with often used materials is seldom reported. Here, we investigate milling on several typical samples in a prototype ultracold Rb FIB system at 8.5 keV beam energy. For polycrystalline metallic substrates, such as Cu and Au, patterns milled by Rb + ions are observed to have reduced surface roughness but still high milling rates compared with those milled by Ga + ions. Rb + also shows similar sputter rates as 30 keV Ga + on semiconductor substrates GaAs and InP. Special cases for Rb + milling show that the Rb + ion beam has a 2.6 {\texttimes} faster sputter rate on diamond but a 3 {\texttimes} slower sputter rate on Al compared with a normal 30 keV Ga + ion beam. In general, an Rb + ion beam is shown to be suitable for nanostructuring of several basic materials.",

author = "S. Xu and Y. Li and E.J.D. Vredenbregt",

note = "Funding Information: This work is part of the project Next-Generation Focused Ion Beam (No. NWO-TTW16178) of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO). The authors would like to acknowledge helpful discussions with Greg Schwind, Chad Rue, Erik Kieft, and Yuval Greenzweig. ",

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AU - Xu, S.

AU - Li, Y.

AU - Vredenbregt, E.J.D.

N1 - Funding Information: This work is part of the project Next-Generation Focused Ion Beam (No. NWO-TTW16178) of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO). The authors would like to acknowledge helpful discussions with Greg Schwind, Chad Rue, Erik Kieft, and Yuval Greenzweig.

PY - 2022/7/1

Y1 - 2022/7/1

N2 - Several ion source alternatives for current focused ion beam (FIB) systems have been studied to achieve higher brightness, including cold atom ion sources. However, a study of ultracold ions interacting with often used materials is seldom reported. Here, we investigate milling on several typical samples in a prototype ultracold Rb FIB system at 8.5 keV beam energy. For polycrystalline metallic substrates, such as Cu and Au, patterns milled by Rb + ions are observed to have reduced surface roughness but still high milling rates compared with those milled by Ga + ions. Rb + also shows similar sputter rates as 30 keV Ga + on semiconductor substrates GaAs and InP. Special cases for Rb + milling show that the Rb + ion beam has a 2.6 × faster sputter rate on diamond but a 3 × slower sputter rate on Al compared with a normal 30 keV Ga + ion beam. In general, an Rb + ion beam is shown to be suitable for nanostructuring of several basic materials.

AB - Several ion source alternatives for current focused ion beam (FIB) systems have been studied to achieve higher brightness, including cold atom ion sources. However, a study of ultracold ions interacting with often used materials is seldom reported. Here, we investigate milling on several typical samples in a prototype ultracold Rb FIB system at 8.5 keV beam energy. For polycrystalline metallic substrates, such as Cu and Au, patterns milled by Rb + ions are observed to have reduced surface roughness but still high milling rates compared with those milled by Ga + ions. Rb + also shows similar sputter rates as 30 keV Ga + on semiconductor substrates GaAs and InP. Special cases for Rb + milling show that the Rb + ion beam has a 2.6 × faster sputter rate on diamond but a 3 × slower sputter rate on Al compared with a normal 30 keV Ga + ion beam. In general, an Rb + ion beam is shown to be suitable for nanostructuring of several basic materials.

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