Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

A. Graaf, de; E. Aldea; G. Dinescu; M.C.M. Sanden, van de

doi:10.1088/0963-0252/10/3/317

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

A. Graaf, de, E. Aldea, G. Dinescu, M.C.M. Sanden, van de

Plasma & Materials Processing

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Abstract

The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s-1 rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.

Original language	English
Pages (from-to)	524-529
Journal	Plasma Sources Science and Technology
Volume	10
Issue number	3
DOIs	https://doi.org/10.1088/0963-0252/10/3/317
Publication status	Published - 2001

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title = "Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle",

abstract = "The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s-1 rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.",

author = "\{Graaf, de\}, A. and E. Aldea and G. Dinescu and \{Sanden, van de\}, M.C.M.",

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AU - Graaf, de, A.

AU - Aldea, E.

AU - Dinescu, G.

AU - Sanden, van de, M.C.M.

PY - 2001

Y1 - 2001

N2 - The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s-1 rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.

AB - The chemistry of an argon/nitrogen thermal plasma expanding through a graphite nozzle is investigated in order to unravel the role of plasma species in the deposition (1-3 nm s-1 rate) of non-hydrogenated amorphous carbon nitride (a-C:N) films. The spectral emission of plasma species is studied and is used in combination with mass spectrometry and nozzle temperature measurements to distinguish possible mechanisms of species production and excitation.

U2 - 10.1088/0963-0252/10/3/317

DO - 10.1088/0963-0252/10/3/317

M3 - Article

SN - 0963-0252

VL - 10

SP - 524

EP - 529

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 3

ER -

Investigation of processes in low-pressure expanding thermal plasmas used for carbon nitride deposition: II. Ar/N2 plasma with graphite nozzle

Abstract

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