Abstract
Roundness profiles are compared which were obtained from measurements carried out at five national metrology laboratories. In the analysis, standard deviations and maximum deviations were calculated from point-by-point differences of the profiles with reference to one another or to the reference profile. Fourier analysis was used to select a spectral area for an analysis at the edge of the significance limit. The comparison shown that each participating laboratory is able to measure a roundness profile with a standard deviation in each data point of less than 2 nm.
Original language | English |
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Pages (from-to) | 67-73 |
Journal | Metrologia |
Volume | 33 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1996 |