Interaction between EUV and construction materials

Mark van de Kerkhof

doi:10.1117/12.3057847

Interaction between EUV and construction materials

Mark van de Kerkhof (Corresponding author)

Elementary Processes in Gas Discharges

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of sub-10nm lithography. The energetic photons and the ionization of the background gas by these photons result in a harsh environment for construction materials within the scanner. For application in upcoming EUV scanners, construction materials must be compatible with source powers of up to 1000 W, for >20 years of operation. This puts stringent requirements on the construction materials, manufacturing methods, cleaning and pretreatments. Besides effects of radiation and plasma, also surface charging risks must be considered, either from photoelectric effects or from ionization of the gas. In this paper, we will give an overview of the possible physical and chemical interactions between construction materials and photons and photon-induced plasma, and possible mitigations to prevent damage.

Original language	English
Title of host publication	Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)
Editors	Libor Juha, Sasa Bajt, Stephane Guizard
Publisher	SPIE
Number of pages	5
ISBN (Electronic)	9781510688629
DOIs	https://doi.org/10.1117/12.3057847
Publication status	Published - 2025
Event	Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9) - Prague, Czech Republic Duration: 7 Apr 2025 → 9 Apr 2025

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	13533
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)
Country/Territory	Czech Republic
City	Prague
Period	7/04/25 → 9/04/25

Bibliographical note

Publisher Copyright:
© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

Keywords

EUV
EUV-induced plasma
Plasma-assisted discharge
X-ray

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10.1117/12.3057847

Cite this

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title = "Interaction between EUV and construction materials",

abstract = "EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of sub-10nm lithography. The energetic photons and the ionization of the background gas by these photons result in a harsh environment for construction materials within the scanner. For application in upcoming EUV scanners, construction materials must be compatible with source powers of up to 1000 W, for >20 years of operation. This puts stringent requirements on the construction materials, manufacturing methods, cleaning and pretreatments. Besides effects of radiation and plasma, also surface charging risks must be considered, either from photoelectric effects or from ionization of the gas. In this paper, we will give an overview of the possible physical and chemical interactions between construction materials and photons and photon-induced plasma, and possible mitigations to prevent damage.",

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author = "\{van de Kerkhof\}, Mark",

note = "Publisher Copyright: {\textcopyright} COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.; Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9) ; Conference date: 07-04-2025 Through 09-04-2025",

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doi = "10.1117/12.3057847",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Libor Juha and Sasa Bajt and Stephane Guizard",

booktitle = "Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)",

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van de Kerkhof, M 2025, Interaction between EUV and construction materials. in L Juha, S Bajt & S Guizard (eds), Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)., 1353307, Proceedings of SPIE - The International Society for Optical Engineering, vol. 13533, SPIE, Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9), Prague, Czech Republic, 7/04/25. https://doi.org/10.1117/12.3057847

Interaction between EUV and construction materials. / van de Kerkhof, Mark (Corresponding author).
Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9). ed. / Libor Juha; Sasa Bajt; Stephane Guizard. SPIE, 2025. 1353307 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13533).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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T1 - Interaction between EUV and construction materials

AU - van de Kerkhof, Mark

N1 - Publisher Copyright: © COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

PY - 2025

Y1 - 2025

N2 - EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of sub-10nm lithography. The energetic photons and the ionization of the background gas by these photons result in a harsh environment for construction materials within the scanner. For application in upcoming EUV scanners, construction materials must be compatible with source powers of up to 1000 W, for >20 years of operation. This puts stringent requirements on the construction materials, manufacturing methods, cleaning and pretreatments. Besides effects of radiation and plasma, also surface charging risks must be considered, either from photoelectric effects or from ionization of the gas. In this paper, we will give an overview of the possible physical and chemical interactions between construction materials and photons and photon-induced plasma, and possible mitigations to prevent damage.

AB - EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of sub-10nm lithography. The energetic photons and the ionization of the background gas by these photons result in a harsh environment for construction materials within the scanner. For application in upcoming EUV scanners, construction materials must be compatible with source powers of up to 1000 W, for >20 years of operation. This puts stringent requirements on the construction materials, manufacturing methods, cleaning and pretreatments. Besides effects of radiation and plasma, also surface charging risks must be considered, either from photoelectric effects or from ionization of the gas. In this paper, we will give an overview of the possible physical and chemical interactions between construction materials and photons and photon-induced plasma, and possible mitigations to prevent damage.

KW - EUV

KW - EUV-induced plasma

KW - Plasma-assisted discharge

KW - X-ray

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DO - 10.1117/12.3057847

M3 - Conference contribution

AN - SCOPUS:105014198014

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)

A2 - Juha, Libor

A2 - Bajt, Sasa

A2 - Guizard, Stephane

PB - SPIE

T2 - Optics Damage and Materials Processing by EUV/X-Ray Radiation (XDam9)

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ER -

Interaction between EUV and construction materials

Abstract

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Keywords

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