Abstract
We present the design, fabrication and characterization of an InP-based membrane photodetector on an SOI wafer containing a Si-wiring photonic circuit. Measured detector responsivity and 3 dB bandwidth are 0.45 A/W and 33 GHz, respectively. The photonic device fabrication is compatible with wafer scale processing steps, guaranteeing compatibility towards future generation electronic IC processing.
Original language | English |
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Title of host publication | Proceedings of the 6th IEEE International Conference on Group IV Photonics 2009. GFP '09, 9-11 September 2009, San Francisco, California |
Place of Publication | Piscataway |
Publisher | Institute of Electrical and Electronics Engineers |
Pages | 214-216 |
ISBN (Print) | 978-1-4244-4403-8 |
DOIs | |
Publication status | Published - 2009 |