Innovation and synergy in thin film deposition: from plasma-based chemical vapor deposition to atomic and molecular layer deposition

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Department of Applied Physics
Supervisors/Advisors
  • Creatore, M. (Adriana), Promotor
  • Kessels, W.M.M. (Erwin), Promotor
Award date24 Jun 2019
Place of PublicationEindhoven
Publisher
Print ISBNs978-90-386-4794-4
Publication statusPublished - 24 Jun 2019

Bibliographical note

Proefschrift.

Promotion : time and place

  • 13.30h, Atlas, room 0.710

Cite this

@phdthesis{2b29cb8b7fbf4eb89a13cc6b6234ece9,
title = "Innovation and synergy in thin film deposition: from plasma-based chemical vapor deposition to atomic and molecular layer deposition",
author = "Morteza Aghaee",
note = "Proefschrift.",
year = "2019",
month = "6",
day = "24",
language = "English",
isbn = "978-90-386-4794-4",
publisher = "Technische Universiteit Eindhoven",
school = "Department of Applied Physics",

}

Innovation and synergy in thin film deposition : from plasma-based chemical vapor deposition to atomic and molecular layer deposition. / Aghaee, Morteza.

Eindhoven : Technische Universiteit Eindhoven, 2019. 208 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

TY - THES

T1 - Innovation and synergy in thin film deposition

T2 - from plasma-based chemical vapor deposition to atomic and molecular layer deposition

AU - Aghaee, Morteza

N1 - Proefschrift.

PY - 2019/6/24

Y1 - 2019/6/24

M3 - Phd Thesis 1 (Research TU/e / Graduation TU/e)

SN - 978-90-386-4794-4

PB - Technische Universiteit Eindhoven

CY - Eindhoven

ER -