Infrared spectroscopy of a dusty RF plasma

W.W. Stoffels; E. Stoffels; G.M.W. Kroesen; M. Haverlag; J.H.W.G. Boer, den; F.J. Hoog, de

doi:10.1088/0963-0252/3/3/013

Infrared spectroscopy of a dusty RF plasma

W.W. Stoffels, E. Stoffels, G.M.W. Kroesen, M. Haverlag, J.H.W.G. Boer, den, F.J. Hoog, de

Research output: Contribution to journal › Article › Academic › peer-review

20 Citations (Scopus)

Abstract

Ar RF discharge. Strong absorption bands at 1000-1100 cm-1 have been found and attributed to C-F and Si-F absorption. Furthermore continuous extinction due to Rayleigh and Mie scattering has been observed. The relative intensities of C-F, Si-F and scattering signals vary with plasma conditions. There are several experimental indications that the clusters are formed on the surface and ejected into the plasma. An SEM study of the substrate surface has allowed us to establish the mechanism for the particulate production in this discharge.

Original language	English
Pages (from-to)	320-324
Journal	Plasma Sources Science and Technology
Volume	3
Issue number	3
DOIs	https://doi.org/10.1088/0963-0252/3/3/013
Publication status	Published - 1994

Access to Document

10.1088/0963-0252/3/3/013

Cite this

@article{7fc9428469db4095b0edf6e8505ad6d5,

title = "Infrared spectroscopy of a dusty RF plasma",

abstract = "Ar RF discharge. Strong absorption bands at 1000-1100 cm-1 have been found and attributed to C-F and Si-F absorption. Furthermore continuous extinction due to Rayleigh and Mie scattering has been observed. The relative intensities of C-F, Si-F and scattering signals vary with plasma conditions. There are several experimental indications that the clusters are formed on the surface and ejected into the plasma. An SEM study of the substrate surface has allowed us to establish the mechanism for the particulate production in this discharge.",

author = "W.W. Stoffels and E. Stoffels and G.M.W. Kroesen and M. Haverlag and {Boer, den}, J.H.W.G. and {Hoog, de}, F.J.",

year = "1994",

doi = "10.1088/0963-0252/3/3/013",

language = "English",

volume = "3",

pages = "320--324",

journal = "Plasma Sources Science and Technology",

issn = "0963-0252",

publisher = "IOP Publishing Ltd.",

number = "3",

}

TY - JOUR

T1 - Infrared spectroscopy of a dusty RF plasma

AU - Stoffels, W.W.

AU - Stoffels, E.

AU - Kroesen, G.M.W.

AU - Haverlag, M.

AU - Boer, den, J.H.W.G.

AU - Hoog, de, F.J.

PY - 1994

Y1 - 1994

N2 - Ar RF discharge. Strong absorption bands at 1000-1100 cm-1 have been found and attributed to C-F and Si-F absorption. Furthermore continuous extinction due to Rayleigh and Mie scattering has been observed. The relative intensities of C-F, Si-F and scattering signals vary with plasma conditions. There are several experimental indications that the clusters are formed on the surface and ejected into the plasma. An SEM study of the substrate surface has allowed us to establish the mechanism for the particulate production in this discharge.

AB - Ar RF discharge. Strong absorption bands at 1000-1100 cm-1 have been found and attributed to C-F and Si-F absorption. Furthermore continuous extinction due to Rayleigh and Mie scattering has been observed. The relative intensities of C-F, Si-F and scattering signals vary with plasma conditions. There are several experimental indications that the clusters are formed on the surface and ejected into the plasma. An SEM study of the substrate surface has allowed us to establish the mechanism for the particulate production in this discharge.

U2 - 10.1088/0963-0252/3/3/013

DO - 10.1088/0963-0252/3/3/013

M3 - Article

SN - 0963-0252

VL - 3

SP - 320

EP - 324

JO - Plasma Sources Science and Technology

JF - Plasma Sources Science and Technology

IS - 3

ER -

Infrared spectroscopy of a dusty RF plasma

Abstract

Access to Document

Fingerprint

Cite this