Abstract
The effect of the deposition temperature and the temperature during rapid thermal annealing on the electrical properties of reactive-magnetron-sputtered indium tin oxide (ITO) layers is described. The relations observed are explained in terms of the defect chemistry of ITO.
Original language | English |
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Pages (from-to) | 3432-3434 |
Number of pages | 3 |
Journal | Journal of the Electrochemical Society |
Volume | 138 |
Issue number | 11 |
DOIs | |
Publication status | Published - 1 Jan 1991 |
Externally published | Yes |