Influence of the addition of CF4 on the deposition of a-C:H layers using the expanding thermal plasma technique

J.W.A.M. Gielen, M.C.M. Sanden, van de, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)
83 Downloads (Pure)
Original languageEnglish
Pages (from-to)328-332
JournalDiamond and Related Materials
Volume4
Issue number4
DOIs
Publication statusPublished - 1995

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