Influence of the addition of CF4 on the deposition of a-C:H layers using the expanding thermal plasma technique

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Original language	English
Pages (from-to)	328-332
Journal	Diamond and Related Materials
Volume	4
Issue number	4
DOIs	https://doi.org/10.1016/0925-9635(94)05305-7
Publication status	Published - 1995

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@article{874d30cf98ba401d9abbb1389fc07091,

title = "Influence of the addition of CF4 on the deposition of a-C:H layers using the expanding thermal plasma technique",

author = "J.W.A.M. Gielen and {Sanden, van de}, M.C.M. and D.C. Schram",

year = "1995",

doi = "10.1016/0925-9635(94)05305-7",

language = "English",

volume = "4",

pages = "328--332",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier",

number = "4",

}

TY - JOUR

T1 - Influence of the addition of CF4 on the deposition of a-C:H layers using the expanding thermal plasma technique

AU - Gielen, J.W.A.M.

AU - Sanden, van de, M.C.M.

AU - Schram, D.C.

PY - 1995

Y1 - 1995

U2 - 10.1016/0925-9635(94)05305-7

DO - 10.1016/0925-9635(94)05305-7

M3 - Article

SN - 0925-9635

VL - 4

SP - 328

EP - 332

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 4

ER -