Influence of ICP etching on surface morphology of InP substrates

F. Karouta; E.J. Geluk; R.W. Heijden, van der; T.J. Eijkemans; A.Y. Silov; J.J.G.M. Tol, van der; M.K. Smit; H.W.M. Salemink

doi:10.1109/ICIPRM.2004.1442720

Influence of ICP etching on surface morphology of InP substrates

F. Karouta, E.J. Geluk, R.W. Heijden, van der, T.J. Eijkemans, A.Y. Silov, J.J.G.M. Tol, van der, M.K. Smit, H.W.M. Salemink

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

3 Citations (Scopus)

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Abstract

We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.

Original language	English
Title of host publication	16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004
Place of Publication	Kagoshima, Japan
Pages	322-325
Number of pages	4
DOIs	https://doi.org/10.1109/ICIPRM.2004.1442720
Publication status	Published - 2004
Event	16th International Conference on Indium Phosphide and Related Materials (IPRM 2004) - Kagoshima, Japan Duration: 1 Jan 2004 → … Conference number: 16

Conference

Conference	16th International Conference on Indium Phosphide and Related Materials (IPRM 2004)
Abbreviated title	IPRM 2004
Country/Territory	Japan
City	Kagoshima
Period	1/01/04 → …

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Karouta, F., Geluk, E. J., Heijden, van der, R. W., Eijkemans, T. J., Silov, A. Y., Tol, van der, J. J. G. M., Smit, M. K., & Salemink, H. W. M. (2004). Influence of ICP etching on surface morphology of InP substrates. In 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004 (pp. 322-325). Article WP-2. https://doi.org/10.1109/ICIPRM.2004.1442720

@inproceedings{6e6febf9f1d14ad58b885fd00d903458,

title = "Influence of ICP etching on surface morphology of InP substrates",

abstract = "We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.",

author = "F. Karouta and E.J. Geluk and {Heijden, van der}, R.W. and T.J. Eijkemans and A.Y. Silov and {Tol, van der}, J.J.G.M. and M.K. Smit and H.W.M. Salemink",

year = "2004",

doi = "10.1109/ICIPRM.2004.1442720",

language = "English",

isbn = "0-7803-8595-0",

pages = "322--325",

booktitle = "16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004",

note = "16th International Conference on Indium Phosphide and Related Materials (IPRM 2004), IPRM 2004 ; Conference date: 01-01-2004",

}

Karouta, F, Geluk, EJ, Heijden, van der, RW, Eijkemans, TJ, Silov, AY , Tol, van der, JJGM , Smit, MK & Salemink, HWM 2004, Influence of ICP etching on surface morphology of InP substrates. in 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004., WP-2, Kagoshima, Japan, pp. 322-325, 16th International Conference on Indium Phosphide and Related Materials (IPRM 2004), Kagoshima, Japan, 1/01/04. https://doi.org/10.1109/ICIPRM.2004.1442720

Influence of ICP etching on surface morphology of InP substrates. / Karouta, F.; Geluk, E.J.; Heijden, van der, R.W. et al.
16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004. Kagoshima, Japan, 2004. p. 322-325 WP-2.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Influence of ICP etching on surface morphology of InP substrates

AU - Karouta, F.

AU - Geluk, E.J.

AU - Heijden, van der, R.W.

AU - Eijkemans, T.J.

AU - Silov, A.Y.

AU - Tol, van der, J.J.G.M.

AU - Smit, M.K.

AU - Salemink, H.W.M.

N1 - Conference code: 16

PY - 2004

Y1 - 2004

N2 - We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.

AB - We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.

UR - http://www.scopus.com/inward/record.url?scp=23744432553&partnerID=8YFLogxK

U2 - 10.1109/ICIPRM.2004.1442720

DO - 10.1109/ICIPRM.2004.1442720

M3 - Conference contribution

SN - 0-7803-8595-0

SP - 322

EP - 325

BT - 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004

CY - Kagoshima, Japan

T2 - 16th International Conference on Indium Phosphide and Related Materials (IPRM 2004)

Y2 - 1 January 2004

ER -

Influence of ICP etching on surface morphology of InP substrates

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