Influence of ICP etching on surface morphology of InP substrates

F. Karouta, E.J. Geluk, R.W. Heijden, van der, T.J. Eijkemans, A.Y. Silov, J.J.G.M. Tol, van der, M.K. Smit, H.W.M. Salemink

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)
3 Downloads (Pure)

Abstract

We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.
Original languageEnglish
Title of host publicationProc. 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004
Place of PublicationKagoshima, Japan
Pages322-325
Number of pages4
DOIs
Publication statusPublished - 2004
Event16th International Conference on Indium Phosphide and Related Materials (IPRM 2004) - Kagoshima, Japan
Duration: 1 Jan 2004 → …
Conference number: 16

Publication series

NameConference Proceedings - International Conference on Indium Phosphide and Related Materials
ISSN (Print)1092-8669

Conference

Conference16th International Conference on Indium Phosphide and Related Materials (IPRM 2004)
Abbreviated titleIPRM 2004
Country/TerritoryJapan
CityKagoshima
Period1/01/04 → …

Fingerprint

Dive into the research topics of 'Influence of ICP etching on surface morphology of InP substrates'. Together they form a unique fingerprint.

Cite this