Influence of a magnetic field on an extreme ultraviolet photon-induced plasma afterglow

R. Limpens, Bart Platier (Corresponding author), A. Lassise, Tim J.A. Staps, Mark A.W. van Ninhuijs, O.J. Luiten, Job Beckers (Corresponding author)

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Abstract

Understanding extreme ultraviolet (EUV) photon-induced plasma dynamics is key to increasing the lifetime of the new generation of lithography machines. The plasma decay times were determined by means of a non-destructive microwave method, microwave cavity resonance spectroscopy, for unmagnetized and magnetized EUV photon-induced plasma afterglows with the argon pressure ranging from 0.002 to 10 Pa. As a result of an external magnet with a magnetic field strength of (57 ± 1) mT, the plasma decay times were extended by two orders of magnitude. Good agreement was found between these measured plasma decay times and four diffusion models, i.e. the ion acoustic, ambipolar, classical-collision, and Bohm's diffusion model.
Original languageEnglish
Article number435205
JournalJournal of Physics D: Applied Physics
Volume54
Issue number43
DOIs
Publication statusPublished - Oct 2021

Keywords

  • EUV photon-induced plasma
  • MCRS
  • afterglow
  • magnetic field
  • magnetized
  • microwave cavity
  • plasma

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