Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl2

C.F. Carlström, R. van der Heijden, A.A.M. Kok, R.W. van der Heijden, F. Karouta, J.J.G.M. van der Tol, R. Nötzel, P. J. van Veldhoven, H.W.M. Salemink

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

We have investigated ICP-etching of deep photonic crystal holes in InP using solely Cl2 as supplied etching gas. The influence of process parameters on hole geometry is discussed and optical test results are reported
Original languageEnglish
Title of host publication2005 International Conference on Indium Phosphide and Related Materials
Pages500-503
Number of pages4
DOIs
Publication statusPublished - 1 Dec 2005
Event2005 International Conference on Indium Phosphide and Related Materials - Glasgow, Scotland, United Kingdom
Duration: 8 May 200512 May 2005

Conference

Conference2005 International Conference on Indium Phosphide and Related Materials
Country/TerritoryUnited Kingdom
CityGlasgow, Scotland
Period8/05/0512/05/05

Fingerprint

Dive into the research topics of 'Inductively coupled plasma etching of deep photonic crystal holes in InP using Cl<sub>2</sub>'. Together they form a unique fingerprint.

Cite this