In situ spectroscopic ellipsometry for atomic layer deposition

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Abstract

The application of in situ spectroscopic ellipsometry during thin film synthesis by atomic layer deposition (ALD) is examined for results obtained on Al2O3, TaNx, and TiN films with thicknesses ranging from 0.1 to 100 nm. By analyzing the film thickness and the energy dispersion of the optical constants of the films, the layer-by-layer growth and material properties of the ALD films can be studied in detail. The growth rate per cycle and the nucleation behavior of the films can be addressed by monitoring the thickness as a function of the number of cycles. It is shown that from the energy dispersion relation, insight into the conductive properties of metallic films can be derived. Moreover, the shape of the dispersion relation can be used to discriminate between different material compositions.
Original languageEnglish
Title of host publicationSVC 52nd Annual Technical Conference, Santa Clara Convention Center, Santa Clara, CA, May 9-14, 2009
Place of PublicationSanta Clara, CA, USA
Pages61-66
Publication statusPublished - 2009
Eventconference, 52nd Annual Technical Conference, Santa Clara, CA, May 9-14, 2009 - Santa Clara, United States
Duration: 9 May 200914 May 2009

Publication series

NameSociety of Vacuum Coaters. Annual Technical Conference Proceedings
Volume505
ISSN (Print)0737-5921

Conference

Conferenceconference, 52nd Annual Technical Conference, Santa Clara, CA, May 9-14, 2009
CountryUnited States
CitySanta Clara
Period9/05/0914/05/09

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