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In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
E. Langereis, S.B.S. Heil, H.C.M. Knoops, W. Keuning, M.C.M. Sanden, van de, W.M.M. Kessels
Research output: Contribution to journal › Article › Academic › peer-review
249
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