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In Situ GA K edge XANES study of the activation of Ga/ZSM-5 prepared by chemical vapor deposition of trimethylgallium

  • E.J.M. Hensen
  • , M. Garcia Sanchez
  • , N.J. Rane
  • , P.C.M.M. Magusin
  • , P.H. Liu
  • , K.J. Chao
  • , R.A. Santen, van

    Research output: Contribution to journalArticleAcademicpeer-review

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    Abstract

    The activation of a dimethylgallium/ZSM-5 precursor to well-defined reduced and oxidized species is studied by in situ Ga Kedge XANES. The precursor is prepared by chemical implanting of trimethylgallium on acidic HZSM-5. Subsequent reductionleads to charge-compensating Ga+ species. Direct oxidation of the trimethylgallium precursor leads to various forms of galliumoxide and regeneration of Br¿nsted acid protons. Oxidation of the reduced Ga+ species yields predominantly to GaO+ species.The GaO+ species exhibit a much higher H2/D2 exchange activity than reduced Ga+ species
    Original languageEnglish
    Pages (from-to)79-85
    Number of pages7
    JournalCatalysis Letters
    Volume101
    Issue number1-2
    DOIs
    Publication statusPublished - 2005

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