@inproceedings{f8298b6568524911bba77d6f230fbf62,
title = "In-situ ellipsometry during the reactive ion etching of SiGe alloys",
author = "G.M.W. Kroesen and G.S. Oehrlein and {Fr{\'e}sart, de}, E.",
year = "1991",
language = "English",
series = "Le vide, les couches minces",
publisher = "Soci{\'e}t{\'e} Fran{\c c}aise du Vide",
pages = "119--120",
booktitle = "Comptes rendus des travaux du 8e colloque international sur les procedes plama, 10-14 juin, 1991, Antibes, Juan-les-Pins, France",
address = "France",
}