In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching

G.M.W. Kroesen, C.J. Timmermans, F.J. Hoog, de, C.J.H. de Zeeuw, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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Original languageEnglish
Title of host publicationISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1
EditorsK. Akashi, A. Kinbara
Place of PublicationTokyo
Pages525-530
Publication statusPublished - 1987
Event8th International Symposium on Plasma Chemistry (ISPC 8) - Tokyo, Japan
Duration: 31 Aug 19874 Sep 1987
Conference number: 8

Conference

Conference8th International Symposium on Plasma Chemistry (ISPC 8)
Abbreviated titleISPC/Tokyo 1987
CountryJapan
CityTokyo
Period31/08/874/09/87

Cite this

Kroesen, G. M. W., Timmermans, C. J., Hoog, de, F. J., de Zeeuw, C. J. H., & Schram, D. C. (1987). In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. In K. Akashi, & A. Kinbara (Eds.), ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1 (pp. 525-530). Tokyo.