In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching

G.M.W. Kroesen, C.J. Timmermans, F.J. Hoog, de, C.J.H. de Zeeuw, D.C. Schram

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

26 Downloads (Pure)
Original languageEnglish
Title of host publicationISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1
EditorsK. Akashi, A. Kinbara
Place of PublicationTokyo
Publication statusPublished - 1987
Event8th International Symposium on Plasma Chemistry (ISPC 8) - Tokyo, Japan
Duration: 31 Aug 19874 Sep 1987
Conference number: 8


Conference8th International Symposium on Plasma Chemistry (ISPC 8)
Abbreviated titleISPC/Tokyo 1987

Cite this