Improved electron-beam lithography with C60 fullerene for InP membrane waveguides

Y. Jiao; J. Pello; L. Shen; E. Smalbrugge; M.K. Smit; J.J.G.M. Tol, van der

Improved electron-beam lithography with C60 fullerene for InP membrane waveguides

Y. Jiao, J. Pello, L. Shen, E. Smalbrugge, M.K. Smit, J.J.G.M. Tol, van der

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.

Original language	English
Title of host publication	Poster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France
Publication status	Published - 2014
Event	26th International Conference on Indium Phosphide and Related Materials (IPRM 2014) - Montpellier, France Duration: 11 May 2014 → 15 May 2014 Conference number: 26

Conference

Conference	26th International Conference on Indium Phosphide and Related Materials (IPRM 2014)
Abbreviated title	IPRM 2014
Country/Territory	France
City	Montpellier
Period	11/05/14 → 15/05/14
Other	26th International Conference on Indium Phosphide and Related Materials

Cite this

@inproceedings{b272d960e7864893b59c1e0c84d573da,

title = "Improved electron-beam lithography with C60 fullerene for InP membrane waveguides",

abstract = "We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.",

author = "Y. Jiao and J. Pello and L. Shen and E. Smalbrugge and M.K. Smit and {Tol, van der}, J.J.G.M.",

year = "2014",

language = "English",

booktitle = "Poster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France",

note = "26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), IPRM 2014 ; Conference date: 11-05-2014 Through 15-05-2014",

}

Jiao, Y, Pello, J, Shen, L, Smalbrugge, E, Smit, MK & Tol, van der, JJGM 2014, Improved electron-beam lithography with C60 fullerene for InP membrane waveguides. in Poster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France. 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), Montpellier, France, 11/05/14.

Improved electron-beam lithography with C60 fullerene for InP membrane waveguides. / Jiao, Y.; Pello, J.; Shen, L. et al.
Poster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France. 2014.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Improved electron-beam lithography with C60 fullerene for InP membrane waveguides

AU - Jiao, Y.

AU - Pello, J.

AU - Shen, L.

AU - Smalbrugge, E.

AU - Smit, M.K.

AU - Tol, van der, J.J.G.M.

N1 - Conference code: 26

PY - 2014

Y1 - 2014

N2 - We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.

AB - We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.

M3 - Conference contribution

BT - Poster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France

T2 - 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014)

Y2 - 11 May 2014 through 15 May 2014

ER -

Improved electron-beam lithography with C60 fullerene for InP membrane waveguides

Abstract

Conference

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