Improved electron-beam lithography with C60 fullerene for InP membrane waveguides

Y. Jiao, J. Pello, L. Shen, E. Smalbrugge, M.K. Smit, J.J.G.M. Tol, van der

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Downloads (Pure)

Abstract

We present a method to prepare a mixed resist material composed of a positive electron-beam resist (ZEP520A) and C60 fullerene. The method is modified from previous methods in literatures to achieve an optimized mixing. An improvement of the mixed material on the thermal resistance respect to the same structures fabricated with normal ZEP resist has been demonstrated by fabricating multimode interference couplers and coupling regions of micro-ring resonators. An improvement on the propagation loss of the InP membrane waveguides from 6.6 to 3.3 dB/cm using this mixed material is also shown.
Original languageEnglish
Title of host publicationPoster presented at the The 26th International Conference on Indium Phosphide and Related Materials (IPRM 2014), 11-15 May, Montpellier, France
Publication statusPublished - 2014
Event26th International Conference on Indium Phosphide and Related Materials (IPRM 2014) - Montpellier, France
Duration: 11 May 201415 May 2014
Conference number: 26

Conference

Conference26th International Conference on Indium Phosphide and Related Materials (IPRM 2014)
Abbreviated titleIPRM 2014
CountryFrance
CityMontpellier
Period11/05/1415/05/14
Other26th International Conference on Indium Phosphide and Related Materials

Fingerprint Dive into the research topics of 'Improved electron-beam lithography with C60 fullerene for InP membrane waveguides'. Together they form a unique fingerprint.

Cite this