Impact of etch stop layer on negative bias illumination stress of amorphous indium gallium zinc oxide transistors

A. Bhoolokam, M. Nag, A. Chasin, S. Steudel, J. Genoe, G. Gelinck, G. Groeseneken, P. Heremans

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

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Engineering & Materials Science