Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study

W.M.M. Kessels; M.C.M. Sanden, van de; R.J. Severens; L.J. IJzendoorn, van; D.C. Schram

Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study

W.M.M. Kessels, M.C.M. Sanden, van de, R.J. Severens, L.J. IJzendoorn, van, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.
Editors	R.E.I. Schropp
Place of Publication	Warrendale (PA)
Publisher	Materials Research Society
Pages	529-534
ISBN (Print)	1-558-99413-0
Publication status	Published - 1999
Event	1998 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 13 Apr 1998 → 17 Apr 1998 https://www.mrs.org/spring1998

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	507
ISSN (Print)	0272-9172

Conference

Conference	1998 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	13/04/98 → 17/04/98
Other	Symposium held at the 1998 MRS Spring Meeting
Internet address	https://www.mrs.org/spring1998

Cite this

Kessels, W. M. M., Sanden, van de, M. C. M., Severens, R. J., IJzendoorn, van, L. J., & Schram, D. C. (1999). Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study. In R. E. I. Schropp (Ed.), Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A. (pp. 529-534). (Materials Research Society Symposium Proceedings; Vol. 507). Materials Research Society.

Kessels, W.M.M. ; Sanden, van de, M.C.M. ; Severens, R.J. et al. / Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study. Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.. editor / R.E.I. Schropp. Warrendale (PA) : Materials Research Society, 1999. pp. 529-534 (Materials Research Society Symposium Proceedings).

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title = "Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study",

author = "W.M.M. Kessels and {Sanden, van de}, M.C.M. and R.J. Severens and {IJzendoorn, van}, L.J. and D.C. Schram",

year = "1999",

language = "English",

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series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "529--534",

editor = "R.E.I. Schropp",

booktitle = "Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.",

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note = "1998 MRS Spring Meeting & Exhibit ; Conference date: 13-04-1998 Through 17-04-1998",

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Kessels, WMM , Sanden, van de, MCM, Severens, RJ, IJzendoorn, van, LJ & Schram, DC 1999, Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study. in REI Schropp (ed.), Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.. Materials Research Society Symposium Proceedings, vol. 507, Materials Research Society, Warrendale (PA), pp. 529-534, 1998 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 13/04/98.

Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study. / Kessels, W.M.M.; Sanden, van de, M.C.M.; Severens, R.J. et al.
Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.. ed. / R.E.I. Schropp. Warrendale (PA): Materials Research Society, 1999. p. 529-534 (Materials Research Society Symposium Proceedings; Vol. 507).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

AU - Severens, R.J.

AU - IJzendoorn, van, L.J.

AU - Schram, D.C.

PY - 1999

Y1 - 1999

M3 - Conference contribution

SN - 1-558-99413-0

T3 - Materials Research Society Symposium Proceedings

SP - 529

EP - 534

BT - Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.

A2 - Schropp, R.E.I.

PB - Materials Research Society

CY - Warrendale (PA)

T2 - 1998 MRS Spring Meeting & Exhibit

Y2 - 13 April 1998 through 17 April 1998

ER -

Kessels WMM , Sanden, van de MCM, Severens RJ, IJzendoorn, van LJ , Schram DC. Hydrogen in an a-Si:H deposited by an expanding thermal plasma : A temperature, growth rate and isotope study. In Schropp REI, editor, Amorphous and microcrystalline silicon technology - 1998 : symposium held April 14 - 17, 1998, San Francisco, California, U.S.A.. Warrendale (PA): Materials Research Society. 1999. p. 529-534. (Materials Research Society Symposium Proceedings).