Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors

Y. De Koninck; G. Roelkens; R.G.F. Baets

Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors

Y. De Koninck
, G. Roelkens
, R.G.F. Baets

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We present a novel approach to design compact, single mode, hybrid 111-V/silicon microlasers. At both ends of the 111-V laser cavity, silicon gratings are operated in a resonant regime to allow high reflection over a short distance. We have verified this technique numerically andfound that, for a thick bonding layer of350 nm, more than 93% reflection can be obtained over a distance of less than 20 pm.

Original language	English
Title of host publication	Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands
Editors	J. Pozo, M. Mortensen, P. Urbach, X. Leijtens, M. Yousefi
Place of Publication	Delft
Publisher	TNO
Pages	173-176
ISBN (Print)	978-90-78314-15-8
Publication status	Published - 2010

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title = "Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors",

abstract = "We present a novel approach to design compact, single mode, hybrid 111-V/silicon microlasers. At both ends of the 111-V laser cavity, silicon gratings are operated in a resonant regime to allow high reflection over a short distance. We have verified this technique numerically andfound that, for a thick bonding layer of350 nm, more than 93\% reflection can be obtained over a distance of less than 20 pm.",

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year = "2010",

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Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors. / De Koninck, Y.; Roelkens, G.; Baets, R.G.F.
Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands. ed. / J. Pozo; M. Mortensen; P. Urbach; X. Leijtens; M. Yousefi. Delft: TNO, 2010. p. 173-176.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors

AU - De Koninck, Y.

AU - Roelkens, G.

AU - Baets, R.G.F.

PY - 2010

Y1 - 2010

N2 - We present a novel approach to design compact, single mode, hybrid 111-V/silicon microlasers. At both ends of the 111-V laser cavity, silicon gratings are operated in a resonant regime to allow high reflection over a short distance. We have verified this technique numerically andfound that, for a thick bonding layer of350 nm, more than 93% reflection can be obtained over a distance of less than 20 pm.

AB - We present a novel approach to design compact, single mode, hybrid 111-V/silicon microlasers. At both ends of the 111-V laser cavity, silicon gratings are operated in a resonant regime to allow high reflection over a short distance. We have verified this technique numerically andfound that, for a thick bonding layer of350 nm, more than 93% reflection can be obtained over a distance of less than 20 pm.

M3 - Conference contribution

SN - 978-90-78314-15-8

SP - 173

EP - 176

BT - Proceedings of the 15th Annual Symposium of the IEEE Photonics Benelux Chapter, 18-19 November 2010, Delft, The Netherlands

A2 - Pozo, J.

A2 - Mortensen, M.

A2 - Urbach, P.

A2 - Leijtens, X.

A2 - Yousefi, M.

PB - TNO

CY - Delft

ER -

Hybrid III-V/silicon micro-lasers based on resonant cavity reflectors

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