High-speed spatial atomic-layer deposition of aluminium oxide layers for solar cell passivation

P. Poodt, A. Lankhorst, F. Roozeboom, K. Spee, D. Maas, Ad Vermeer

Research output: Contribution to journalArticleAcademicpeer-review

252 Citations (Scopus)
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Abstract

Al2O3 thin films deposited at rates as high as 1.2 nm s-1 using spatially separated atomic layer deposition show excellent solar cell surface passivation properties, i.e., recombination velocities of
Original languageEnglish
Pages (from-to)3564-3567
JournalAdvanced Materials
Volume22
Issue number32
DOIs
Publication statusPublished - 2010

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