High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

Paweł E. Malinowski; Tung Huei Ke; Atsushi Nakamura; Ya Han Liu; Dieter Vander Velpen; Erwin Vandenplas; Nikolas Papadopoulos; Auke Jisk Kronemeijer; Jan Laurens van der Steen; Soeren Steudel; Che Cheng Kuo; Yen Yu Huang; Yu Hsien Chen; Ming Hua Yeh; Gerwin Gelinck; Paul Heremans

doi:10.1002/jsid.643

High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

Paweł E. Malinowski, Tung Huei Ke, Atsushi Nakamura, Ya Han Liu, Dieter Vander Velpen, Erwin Vandenplas, Nikolas Papadopoulos, Auke Jisk Kronemeijer, Jan Laurens van der Steen, Soeren Steudel, Che Cheng Kuo, Yen Yu Huang, Yu Hsien Chen, Ming Hua Yeh, Gerwin Gelinck, Paul Heremans

Molecular Materials and Nanosystems

Research output: Contribution to journal › Article › Academic › peer-review

29 Citations (Scopus)

Abstract

High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).

Original language	English
Pages (from-to)	128-136
Number of pages	9
Journal	Journal of the Society for Information Display
Volume	26
Issue number	3
DOIs	https://doi.org/10.1002/jsid.643
Publication status	Published - 1 Mar 2018

Funding

This work has been carried out in the framework of Holst Centre, an open innovation platform created by IMEC and TNO. The authors would like to thank the process engineers of Holst Centre’s GEN1 TFT Pilot Line for fabrication of the IGZO display backplanes used here.

Keywords

AMOLED display
photolithography
RGB OLED
ultra-high resolution

Access to Document

10.1002/jsid.643

Cite this

Malinowski, P. E., Ke, T. H., Nakamura, A., Liu, Y. H., Vander Velpen, D., Vandenplas, E., Papadopoulos, N., Kronemeijer, A. J., van der Steen, J. L., Steudel, S., Kuo, C. C., Huang, Y. Y., Chen, Y. H., Yeh, M. H., Gelinck, G., & Heremans, P. (2018). High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays. Journal of the Society for Information Display, 26(3), 128-136. https://doi.org/10.1002/jsid.643

@article{80f1543ae2d2469e931ad6e3f06c5d2c,

title = "High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays",

abstract = "High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).",

keywords = "AMOLED display, photolithography, RGB OLED, ultra-high resolution",

author = "Malinowski, {Pawe{\l} E.} and Ke, {Tung Huei} and Atsushi Nakamura and Liu, {Ya Han} and {Vander Velpen}, Dieter and Erwin Vandenplas and Nikolas Papadopoulos and Kronemeijer, {Auke Jisk} and {van der Steen}, {Jan Laurens} and Soeren Steudel and Kuo, {Che Cheng} and Huang, {Yen Yu} and Chen, {Yu Hsien} and Yeh, {Ming Hua} and Gerwin Gelinck and Paul Heremans",

year = "2018",

month = mar,

day = "1",

doi = "10.1002/jsid.643",

language = "English",

volume = "26",

pages = "128--136",

journal = "Journal of the Society for Information Display",

issn = "1071-0922",

publisher = "Wiley-Blackwell",

number = "3",

}

Malinowski, PE, Ke, TH, Nakamura, A, Liu, YH, Vander Velpen, D, Vandenplas, E, Papadopoulos, N, Kronemeijer, AJ, van der Steen, JL, Steudel, S, Kuo, CC, Huang, YY, Chen, YH, Yeh, MH, Gelinck, G & Heremans, P 2018, 'High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays', Journal of the Society for Information Display, vol. 26, no. 3, pp. 128-136. https://doi.org/10.1002/jsid.643

TY - JOUR

T1 - High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

AU - Malinowski, Paweł E.

AU - Ke, Tung Huei

AU - Nakamura, Atsushi

AU - Liu, Ya Han

AU - Vander Velpen, Dieter

AU - Vandenplas, Erwin

AU - Papadopoulos, Nikolas

AU - Kronemeijer, Auke Jisk

AU - van der Steen, Jan Laurens

AU - Steudel, Soeren

AU - Kuo, Che Cheng

AU - Huang, Yen Yu

AU - Chen, Yu Hsien

AU - Yeh, Ming Hua

AU - Gelinck, Gerwin

AU - Heremans, Paul

PY - 2018/3/1

Y1 - 2018/3/1

N2 - High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).

AB - High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).

KW - AMOLED display

KW - photolithography

KW - RGB OLED

KW - ultra-high resolution

UR - http://www.scopus.com/inward/record.url?scp=85044774310&partnerID=8YFLogxK

U2 - 10.1002/jsid.643

DO - 10.1002/jsid.643

M3 - Article

AN - SCOPUS:85044774310

SN - 1071-0922

VL - 26

SP - 128

EP - 136

JO - Journal of the Society for Information Display

JF - Journal of the Society for Information Display

IS - 3

ER -

High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

Abstract

Funding

Keywords

Access to Document

Other files and links

Fingerprint

Cite this