High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

Paweł E. Malinowski, Tung Huei Ke, Atsushi Nakamura, Ya Han Liu, Dieter Vander Velpen, Erwin Vandenplas, Nikolas Papadopoulos, Auke Jisk Kronemeijer, Jan Laurens van der Steen, Soeren Steudel, Che Cheng Kuo, Yen Yu Huang, Yu Hsien Chen, Ming Hua Yeh, Gerwin Gelinck, Paul Heremans

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8 Citations (Scopus)

Abstract

High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).

Original languageEnglish
Pages (from-to)128-136
Number of pages9
JournalJournal of the Society for Information Display
Volume26
Issue number3
DOIs
Publication statusPublished - 1 Mar 2018

Keywords

  • AMOLED display
  • photolithography
  • RGB OLED
  • ultra-high resolution

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    Malinowski, P. E., Ke, T. H., Nakamura, A., Liu, Y. H., Vander Velpen, D., Vandenplas, E., Papadopoulos, N., Kronemeijer, A. J., van der Steen, J. L., Steudel, S., Kuo, C. C., Huang, Y. Y., Chen, Y. H., Yeh, M. H., Gelinck, G., & Heremans, P. (2018). High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays. Journal of the Society for Information Display, 26(3), 128-136. https://doi.org/10.1002/jsid.643