High rate remote plasma deposition of a-C:H radical chemistry vs. ion energy

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationISSP 2011 : the eleventh international symposium on sputtering & plasma processes : July 6-8, 2011, Kyoto, Japan
Pages15-
Publication statusPublished - 2011

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