High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma

K. Nadir; B. Hoex; P.J. Oever, van den; W.M.M. Kessels; M.C.M. Sanden, van de

High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma

K. Nadir, B. Hoex, P.J. Oever, van den, W.M.M. Kessels, M.C.M. Sanden, van de

Research output: Contribution to conference › Poster

Abstract

No abstract

Original language	English
Pages	B 8-
Publication status	Published - 2006
Event	18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands - Lunteren, Netherlands Duration: 22 Mar 2006 → 23 Mar 2006

Conference

Conference	18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands
Country/Territory	Netherlands
City	Lunteren
Period	22/03/06 → 23/03/06

Bibliographical note

18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

Cite this

@conference{97dc4d4230e54a6ab498fc683076d23f,

title = "High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma",

abstract = "No abstract",

author = "K. Nadir and B. Hoex and {Oever, van den}, P.J. and W.M.M. Kessels and {Sanden, van de}, M.C.M.",

note = "18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts; 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands ; Conference date: 22-03-2006 Through 23-03-2006",

year = "2006",

language = "English",

pages = "B 8--",

}

High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma. / Nadir, K.; Hoex, B.; Oever, van den, P.J. et al.
2006. B 8- Poster session presented at 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands, Lunteren, Netherlands.

Research output: Contribution to conference › Poster

TY - CONF

T1 - High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma

AU - Nadir, K.

AU - Hoex, B.

AU - Oever, van den, P.J.

AU - Kessels, W.M.M.

AU - Sanden, van de, M.C.M.

N1 - 18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

PY - 2006

Y1 - 2006

N2 - No abstract

AB - No abstract

M3 - Poster

SP - B 8-

T2 - 18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands

Y2 - 22 March 2006 through 23 March 2006

ER -

High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma

Abstract

Conference

Bibliographical note

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Cite this