@inproceedings{a3038c1a96234913b8231002f7fc84b0,
title = "High rate deposition of amorphous hydrogenated silicon using an expanding thermal plasma",
author = "R.J. Severens and W.M.M. Kessels and L. Gabella and {van de Pas}, F. and {Sanden, van de}, M.C.M. and D.C. Schram",
year = "1997",
language = "English",
isbn = "7-301-03483-0",
pages = "1059--1064",
editor = "C.K. Wu",
booktitle = "Proceedings of the 13th International Symposium on Plasma Chemistry III, Beijing, China, 18-22 augustus, 1997",
publisher = "Peking University Press",
note = "13th International Symposium on Plasma Chemistry (ISPC 13), August 18-22, 1997, Beijing, China, ISPC 13 ; Conference date: 18-08-1997 Through 22-08-1997",
}