High-rate deposition of a-SiNx:H films for photovoltaic applications

W.M.M. Kessels, F.J.H. van Assche, J. Hong, J.D. Moschner, T. Lauinger, D.C. Schram, M.C.M. van de Sanden

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

6 Citations (Scopus)

Abstract

The feasibility of the new 'Expanding Thermal Plasma' technique for the deposition of a-SiNx:H at high deposition rates (typically ∼200 Å/s) has been investigated. The structural film properties of the a-SiNx:H are reported for various process conditions and the application of the material as antireflection coating on (multi)crystalline silicon solar cells is studied. Furthermore, the performance of the material for surface and bulk passivation is investigated.

Original languageEnglish
Title of host publicationAmorphous and heterogeneous silicon-based films - 2001 : symposium held [at the 2001 MRS spring meeting,] April 16 - 20, 2001, San Francisco, California, U.S.A.
EditorsM. Stutzmann, J.B. Boyce, J.D. Cohen, xx et al.
Place of PublicationWarrendale, PA, USA
PublisherMaterials Research Society
Number of pages6
ISBN (Print)1-558-99600-1
DOIs
Publication statusPublished - 1 Dec 2001
Event2001MRS Spring Meeting & Exhibit - San Francisco, United States
Duration: 16 Apr 200120 Apr 2001
https://www.mrs.org/spring2001

Publication series

NameMaterials Research Society Symposium Proceedings
Volume664
ISSN (Print)0272-9172

Conference

Conference2001MRS Spring Meeting & Exhibit
Country/TerritoryUnited States
CitySan Francisco
Period16/04/0120/04/01
Other
Internet address

Funding

Dr. F.M. Schuurmans from Shell Solar Energy B.V. and Dr. A.W. Weeber and Dr. W.J. Soppe of the Netherlands Energy Research Foundation are acknowledged for the experiments on mc-Si solar cells. Dr. W. Arnold Bik of the Utrecht University is greatly acknowledged for the ERD analysis. This work is partly performed within the ‘Sunovation’ project.

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