High-rate deposition of a-SiNx:H films for photovoltaic applications

W.M.M. Kessels, F.J.H. van Assche, J. Hong, J.D. Moschner, T. Lauinger, D.C. Schram, M.C.M. van de Sanden

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

6 Citations (Scopus)


The feasibility of the new 'Expanding Thermal Plasma' technique for the deposition of a-SiNx:H at high deposition rates (typically ∼200 Å/s) has been investigated. The structural film properties of the a-SiNx:H are reported for various process conditions and the application of the material as antireflection coating on (multi)crystalline silicon solar cells is studied. Furthermore, the performance of the material for surface and bulk passivation is investigated.

Original languageEnglish
Title of host publicationAmorphous and heterogeneous silicon-based films - 2001 : symposium held [at the 2001 MRS spring meeting,] April 16 - 20, 2001, San Francisco, California, U.S.A.
EditorsM. Stutzmann, J.B. Boyce, J.D. Cohen, xx et al.
Place of PublicationWarrendale, PA, USA
PublisherMaterials Research Society
Number of pages6
ISBN (Print)1-558-99600-1
Publication statusPublished - 1 Dec 2001
Event2001MRS Spring Meeting & Exhibit - San Francisco, United States
Duration: 16 Apr 200120 Apr 2001

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Conference2001MRS Spring Meeting & Exhibit
Country/TerritoryUnited States
CitySan Francisco
Internet address


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