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High-rate anisotropic silicon etching with the expanding thermal plasma technique
M.A. Blauw, P.J.W. van Lankvelt, F. Roozeboom, W.M.M. Kessels, M.C.M. Sanden, van de
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
1
Citation
(Scopus)