High-rate anisotropic silicon etching with the expanding thermal plasma technique

M.A. Blauw, P.J.W. van Lankvelt, F. Roozeboom, W.M.M. Kessels, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

Fingerprint

Dive into the research topics of 'High-rate anisotropic silicon etching with the expanding thermal plasma technique'. Together they form a unique fingerprint.

Material Science