@article{7ec9873812394976a099dcb3e63aea65,
title = "High rate (~3 nm/s) deposition of dense silicon nitride films at low substrate temperatures (",
abstract = "The deposition of amorphous silicon nitride (a-SiNx:H) films at high deposition rates (3 nm/s) and at low substrate temperatures (",
author = "{Assche, van}, F.J.H. and W.M.M. Kessels and R. Vangheluwe and W.S. Mischke and M.F.J. Evers and {Sanden, van de}, M.C.M.",
year = "2005",
doi = "10.1016/j.tsf.2005.01.095",
language = "English",
volume = "484",
pages = "46--53",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier B.V.",
number = "1-2",
}