High quality SiO2-like layers by large area atmospheric pressure plasma enhanced CVD : Deposition process studies by surface analysis

P.A. Premkumar; S.A. Starostin; Hinrik Vries, de; R.M.J. Paffen; M. Creatore; T.J. Eijkemans; P.M. Koenraad; M.C.M. Sanden, van de

doi:10.1002/ppap.200900033

High quality SiO2-like layers by large area atmospheric pressure plasma enhanced CVD : Deposition process studies by surface analysis

P.A. Premkumar, S.A. Starostin, Hinrik Vries, de, R.M.J. Paffen, M. Creatore, T.J. Eijkemans, P.M. Koenraad, M.C.M. Sanden, van de

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

This work reports on the main competing processes and their contribution to the properties of SiO2 layers on polymers in large area AP-PE-CVD from Ar-N2-O2-HMDSO mixtures. The detailed space resolved surface analysis on the statically deposited films showed smooth SiOx films in the vicinity of the gas injection, as deposited by HMDSO radicals. At the gas effluent, due to HMDSO depletion, non-depositing species interact with the polymer and induce rough deposits with high carbon content. The competition of plasma-polymer surface interaction with HMDSO radicals deposition, is further confirmed from the analysis of films grown on polymers with a "protecting" layer and with reverse gas flow direction. Under web roll conditions, HMDSO radicals deposition is dominant, resulting in high quality SiOx layers along the whole electrode length. © 2009 WILEY-VCH Verlag GmbH & Co. KGaA.

Original language	English
Pages (from-to)	693-702
Journal	Plasma Processes and Polymers
Volume	6
Issue number	10
DOIs	https://doi.org/10.1002/ppap.200900033
Publication status	Published - 2009

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Premkumar, P. A., Starostin, S. A., Vries, de, H., Paffen, R. M. J., Creatore, M., Eijkemans, T. J., ... Sanden, van de, M. C. M. (2009). High quality SiO2-like layers by large area atmospheric pressure plasma enhanced CVD : Deposition process studies by surface analysis. Plasma Processes and Polymers, 6(10), 693-702. https://doi.org/10.1002/ppap.200900033

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abstract = "This work reports on the main competing processes and their contribution to the properties of SiO2 layers on polymers in large area AP-PE-CVD from Ar-N2-O2-HMDSO mixtures. The detailed space resolved surface analysis on the statically deposited films showed smooth SiOx films in the vicinity of the gas injection, as deposited by HMDSO radicals. At the gas effluent, due to HMDSO depletion, non-depositing species interact with the polymer and induce rough deposits with high carbon content. The competition of plasma-polymer surface interaction with HMDSO radicals deposition, is further confirmed from the analysis of films grown on polymers with a {"}protecting{"} layer and with reverse gas flow direction. Under web roll conditions, HMDSO radicals deposition is dominant, resulting in high quality SiOx layers along the whole electrode length. {\circledC} 2009 WILEY-VCH Verlag GmbH & Co. KGaA.",

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High quality SiO2-like layers by large area atmospheric pressure plasma enhanced CVD : Deposition process studies by surface analysis. / Premkumar, P.A.; Starostin, S.A.; Vries, de, Hinrik; Paffen, R.M.J.; Creatore, M.; Eijkemans, T.J.; Koenraad, P.M.; Sanden, van de, M.C.M.

In: Plasma Processes and Polymers, Vol. 6, No. 10, 2009, p. 693-702.

Research output: Contribution to journal › Article › Academic › peer-review

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