High-quality, high-repetition rate, ultrashort electron bunches generated with an RF-cavity

J.F.M. van Rens, W. Verhoeven, E.R. Kieft, J.G.H. Franssen, P.H.A. Mutsaers, O.J. Luiten

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Abstract

In collaboration with FEI Company, we are studying the possi- bility of using microwave TM110 streak cavities in combination with a slit, to chop a continuous electron beam into 100 fs elec- tron bunches.We have shown that this can be done with minimal increase in transverse emittance and longitudinal energy spread. Furthermore, these bunches are created at a repetition rate of 3 GHz. Accurately synchronized to a mode-locked laser system, this allows for high-frequency pump-probe experiments with the beam quality of high-end electron microscopes. At Eindhoven University of Technology, we will soon implement such a cavity in a 200 keV Tecnai, which should result in high- frequency ultrafast (S)TEM with sub-ps time-resolution while maintaining the atomic spatial resolution of the TEM.
Original languageEnglish
Title of host publicationFemtosecond Electron Imaging and Spectroscopy (FEIS-2)
Subtitle of host publicationBook of Abstracts
Place of PublicationEast Lansing, Michigan
PublisherMichigan State University
Publication statusPublished - 2015
EventFemtosecond Electron Imaging and Microscopy 2015 (FEIS-2), May 6-9, 2015, Lansing, MI, USA - Lansing, MI, United States
Duration: 6 May 20159 May 2015
http://www.feis-2.org/

Conference

ConferenceFemtosecond Electron Imaging and Microscopy 2015 (FEIS-2), May 6-9, 2015, Lansing, MI, USA
Abbreviated titleFEIS-2
CountryUnited States
CityLansing, MI
Period6/05/159/05/15
OtherFemtosecond Electron Imaging and Microscopy-2 (FEIS-2) in Lansing, Michigan, USA,
Internet address

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