High-quality a-Si:H growth at high rate using an expanding thermal plasma

M.C.M. Sanden, van de, R.J. Severens, J. Bastiaanssen, D.C. Schram

Research output: Contribution to journalArticleAcademicpeer-review

14 Citations (Scopus)
31 Downloads (Pure)
Original languageEnglish
Pages (from-to)719-722
JournalSurface and Coatings Technology
Volume97
DOIs
Publication statusPublished - 1997

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