High-quality a-Si:H growth at high rate using an expanding thermal plasma

M.C.M. Sanden, van de, R.J. Severens, J. Bastiaanssen, D.C. Schram

Research output: Contribution to journal › Article › Academic › peer-review

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Original language	English
Pages (from-to)	719-722
Journal	Surface and Coatings Technology
Volume	97
DOIs	https://doi.org/10.1016/S0257-8972%2897%2900329-0 https://doi.org/10.1016/S0257-8972(97)00329-0
Publication status	Published - 1997

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title = "High-quality a-Si:H growth at high rate using an expanding thermal plasma",

author = "{Sanden, van de}, M.C.M. and R.J. Severens and J. Bastiaanssen and D.C. Schram",

year = "1997",

doi = "10.1016/S0257-8972%2897%2900329-0",

language = "English",

volume = "97",

pages = "719--722",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

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T1 - High-quality a-Si:H growth at high rate using an expanding thermal plasma

AU - Sanden, van de, M.C.M.

AU - Severens, R.J.

AU - Bastiaanssen, J.

AU - Schram, D.C.

PY - 1997

Y1 - 1997

U2 - 10.1016/S0257-8972%2897%2900329-0

DO - 10.1016/S0257-8972%2897%2900329-0

M3 - Article

SN - 0257-8972

VL - 97

SP - 719

EP - 722

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -