High quality a-Si:H grown at high rate using an expanding thermal plasma

R.J. Severens, J. Bastiaanssen, M.C.M. Sanden, van de, D.C. Schram

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

170 Downloads (Pure)

Original language	English
Title of host publication	PSE : Plasma surface engineering : 5th international conference, Garmisch-Partenkrichen, September 9-13, 1996, abstracts
Pages	131
Publication status	Published - 1996

Access to Document

@inproceedings{f12370fffc374427a883ca6517b71cf6,

title = "High quality a-Si:H grown at high rate using an expanding thermal plasma",

author = "R.J. Severens and J. Bastiaanssen and {Sanden, van de}, M.C.M. and D.C. Schram",

year = "1996",

language = "English",

pages = "131",

booktitle = "PSE : Plasma surface engineering : 5th international conference, Garmisch-Partenkrichen, September 9-13, 1996, abstracts",

}

High quality a-Si:H grown at high rate using an expanding thermal plasma. / Severens, R.J.; Bastiaanssen, J.; Sanden, van de, M.C.M. et al.
PSE : Plasma surface engineering : 5th international conference, Garmisch-Partenkrichen, September 9-13, 1996, abstracts. 1996. p. 131.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic