High-performance imido-amido precursor for the atomic layer deposition of Ta2O5

T. Blanquart, V. Longo, J. Niinistö, M. Heikkilä, K. Kukli, M. Ritala, M. Leskelä

Research output: Contribution to journalArticleAcademicpeer-review

13 Citations (Scopus)
3 Downloads (Pure)

Fingerprint Dive into the research topics of 'High-performance imido-amido precursor for the atomic layer deposition of Ta2O5'. Together they form a unique fingerprint.

Engineering & Materials Science

Chemical Compounds

Physics & Astronomy