High capacitance density MOS capacitor stacks in 3D silicon using plasma-assisted ALD

D. Hoogeland, K.B. Jinesh, F. Roozeboom, W.F.A. Besling, W. Keuning, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Original languageEnglish
Title of host publicationProceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
EditorsW.M.M. Kessels, A. Delabie
Place of PublicationS.n.
Publishers.n.
PagesP-35-
Publication statusPublished - 2008

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