High aspect ratio etching and application in InP-based photonic integrated circuits

F. Karouta, B. Docter, A.A.M. Kok, E.J. Geluk, J.J.G.M. Tol, van der, M.K. Smit

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	proc. ECS Fall Meeting, Symposium Integrated Optoelectronics (E5)
Place of Publication	Honolulu, Hawaii
Pages	MA2008-02-1/1
Publication status	Published - 2008
Event	214th Electrochemical Society Meeting (ECS 2008) - Duration: 12 Oct 2008 → 17 Oct 2008

Conference	214th Electrochemical Society Meeting (ECS 2008)
Period	12/10/08 → 17/10/08

Cite this

@inproceedings{3643efc8ab454290897f3cf24a9c0331,

title = "High aspect ratio etching and application in InP-based photonic integrated circuits",

author = "F. Karouta and B. Docter and A.A.M. Kok and E.J. Geluk and {Tol, van der}, J.J.G.M. and M.K. Smit",

year = "2008",

language = "English",

pages = "MA2008--02--1/1",

booktitle = "proc. ECS Fall Meeting, Symposium Integrated Optoelectronics (E5)",

note = "214th Electrochemical Society Meeting (ECS 2008) ; Conference date: 12-10-2008 Through 17-10-2008",

}

TY - GEN

T1 - High aspect ratio etching and application in InP-based photonic integrated circuits

AU - Karouta, F.

AU - Docter, B.

AU - Kok, A.A.M.

AU - Geluk, E.J.

AU - Tol, van der, J.J.G.M.

AU - Smit, M.K.

PY - 2008

Y1 - 2008

M3 - Conference contribution

SP - MA2008-02-1/1

BT - proc. ECS Fall Meeting, Symposium Integrated Optoelectronics (E5)

CY - Honolulu, Hawaii

T2 - 214th Electrochemical Society Meeting (ECS 2008)

Y2 - 12 October 2008 through 17 October 2008

ER -