Hard Mask Fabrication for Patterning Ultra-High Bit Densities by Large-Area Electron Beam Lithography

C.G.C.H.M. Fabrie; J.T. Kohlhepp; H.J.M. Swagten; B. Koopmans; M.S.P. Andriesse; A.J. Run, van; E.W.J.M. Drift, van der

Hard Mask Fabrication for Patterning Ultra-High Bit Densities by Large-Area Electron Beam Lithography

C.G.C.H.M. Fabrie
, J.T. Kohlhepp
, H.J.M. Swagten
, B. Koopmans
, M.S.P. Andriesse
, A.J. Run, van
, E.W.J.M. Drift, van der

Physics of Nanostructures

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	10th Joint MMM/Intermag Conference; Baltimore, MD, US (7 jan - 11 jan 2007)
Publication status	Published - 2007

Cite this

@inproceedings{659f33d048c7476699668f42c83a842d,

title = "Hard Mask Fabrication for Patterning Ultra-High Bit Densities by Large-Area Electron Beam Lithography",

author = "C.G.C.H.M. Fabrie and J.T. Kohlhepp and H.J.M. Swagten and B. Koopmans and M.S.P. Andriesse and \{Run, van\}, A.J. and \{Drift, van der\}, E.W.J.M.",

year = "2007",

language = "English",

booktitle = "10th Joint MMM/Intermag Conference; Baltimore, MD, US (7 jan - 11 jan 2007)",

}

TY - GEN

T1 - Hard Mask Fabrication for Patterning Ultra-High Bit Densities by Large-Area Electron Beam Lithography

AU - Fabrie, C.G.C.H.M.

AU - Kohlhepp, J.T.

AU - Swagten, H.J.M.

AU - Koopmans, B.

AU - Andriesse, M.S.P.

AU - Run, van, A.J.

AU - Drift, van der, E.W.J.M.

PY - 2007

Y1 - 2007

M3 - Conference contribution

BT - 10th Joint MMM/Intermag Conference; Baltimore, MD, US (7 jan - 11 jan 2007)

ER -