Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma

S.V. Singh, T. Zaharia, M. Creatore, R. Groenen, K. van Hege, M.C.M. Sanden, van de

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Abstract

Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature ( ~ 0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy
Original languageEnglish
Article number013305
Pages (from-to)013305-1/10
Number of pages10
JournalJournal of Applied Physics
Volume107
Issue number1
DOIs
Publication statusPublished - 2010

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carbon
ions
thermal plasmas
bombardment
vapor deposition
electron energy
chemistry
energy

Cite this

Singh, S.V. ; Zaharia, T. ; Creatore, M. ; Groenen, R. ; van Hege, K. ; Sanden, van de, M.C.M. / Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma. In: Journal of Applied Physics. 2010 ; Vol. 107, No. 1. pp. 013305-1/10.
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Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma. / Singh, S.V.; Zaharia, T.; Creatore, M.; Groenen, R.; van Hege, K.; Sanden, van de, M.C.M.

In: Journal of Applied Physics, Vol. 107, No. 1, 013305, 2010, p. 013305-1/10.

Research output: Contribution to journalArticleAcademicpeer-review

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T1 - Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma

AU - Singh, S.V.

AU - Zaharia, T.

AU - Creatore, M.

AU - Groenen, R.

AU - van Hege, K.

AU - Sanden, van de, M.C.M.

PY - 2010

Y1 - 2010

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AB - Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature ( ~ 0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy

U2 - 10.1063/1.3273412

DO - 10.1063/1.3273412

M3 - Article

VL - 107

SP - 013305-1/10

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 1

M1 - 013305

ER -