Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma

S.V. Singh, T. Zaharia, M. Creatore, R. Groenen, K. van Hege, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

26 Citations (Scopus)
91 Downloads (Pure)

Abstract

Hydrogenated amorphous carbon (a-C:H) deposited from an Ar-C2H2 expanding thermal plasma chemical vapor deposition (ETP-CVD) is reported. The downstream plasma region of an ETP is characterized by a low electron temperature ( ~ 0.3 eV), which leads to an ion driven chemistry and negligible physical effects, such as ion bombardment (ion energy
Original languageEnglish
Article number013305
Pages (from-to)013305-1/10
Number of pages10
JournalJournal of Applied Physics
Volume107
Issue number1
DOIs
Publication statusPublished - 2010

Fingerprint Dive into the research topics of 'Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma'. Together they form a unique fingerprint.

Cite this