Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma

J.W.A.M. Gielen; M.C.M. Sanden, van de; W.M.M. Kessels; D.C. Schram

doi:10.1557/PROC-436-287

Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma

J.W.A.M. Gielen, M.C.M. Sanden, van de, W.M.M. Kessels, D.C. Schram

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

1 Citation (Scopus)

145 Downloads (Pure)

Abstract

Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.

Original language	English
Title of host publication	Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.
Editors	W.W. Gerberich
Pages	287-292
DOIs	https://doi.org/10.1557/PROC-436-287
Publication status	Published - 1997
Event	1996 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 8 Apr 1996 → 12 Apr 1996 https://www.mrs.org/spring1996

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	436
ISSN (Print)	0272-9172

Conference

Conference	1996 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	8/04/96 → 12/04/96
Other	Symposium held at the 1996 MRS Spring Meeting
Internet address	https://www.mrs.org/spring1996

Access to Document

10.1557/PROC-436-287

588800Final published version, 657 KB

Cite this

Gielen, J. W. A. M., Sanden, van de, M. C. M., Kessels, W. M. M., & Schram, D. C. (1997). Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma. In W. W. Gerberich (Ed.), Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A. (pp. 287-292). (Materials Research Society Symposium Proceedings; Vol. 436). https://doi.org/10.1557/PROC-436-287

Gielen, J.W.A.M. ; Sanden, van de, M.C.M. ; Kessels, W.M.M. et al. / Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma. Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.. editor / W.W. Gerberich. 1997. pp. 287-292 (Materials Research Society Symposium Proceedings).

@inproceedings{2d93fe3c3cc340b4a62b22978e639273,

title = "Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma",

abstract = "Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.",

author = "J.W.A.M. Gielen and {Sanden, van de}, M.C.M. and W.M.M. Kessels and D.C. Schram",

year = "1997",

doi = "10.1557/PROC-436-287",

language = "English",

isbn = "1-558-99339-8",

series = "Materials Research Society Symposium Proceedings",

pages = "287--292",

editor = "W.W. Gerberich",

booktitle = "Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.",

note = "1996 MRS Spring Meeting & Exhibit ; Conference date: 08-04-1996 Through 12-04-1996",

url = "https://www.mrs.org/spring1996",

}

Gielen, JWAM, Sanden, van de, MCM , Kessels, WMM & Schram, DC 1997, Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma. in WW Gerberich (ed.), Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.. Materials Research Society Symposium Proceedings, vol. 436, pp. 287-292, 1996 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 8/04/96. https://doi.org/10.1557/PROC-436-287

Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma. / Gielen, J.W.A.M.; Sanden, van de, M.C.M.; Kessels, W.M.M. et al.
Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.. ed. / W.W. Gerberich. 1997. p. 287-292 (Materials Research Society Symposium Proceedings; Vol. 436).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma

AU - Gielen, J.W.A.M.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

AU - Schram, D.C.

PY - 1997

Y1 - 1997

N2 - Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.

AB - Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.

U2 - 10.1557/PROC-436-287

DO - 10.1557/PROC-436-287

M3 - Conference contribution

SN - 1-558-99339-8

T3 - Materials Research Society Symposium Proceedings

SP - 287

EP - 292

BT - Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.

A2 - Gerberich, W.W.

T2 - 1996 MRS Spring Meeting & Exhibit

Y2 - 8 April 1996 through 12 April 1996

ER -

Gielen JWAM, Sanden, van de MCM , Kessels WMM , Schram DC. Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma. In Gerberich WW, editor, Thin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.. 1997. p. 287-292. (Materials Research Society Symposium Proceedings). doi: 10.1557/PROC-436-287

Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma

Abstract

Publication series

Conference

Access to Document

Fingerprint

Cite this