Hard amorphous hydrogenated carbon films deposited from an expanding thermal plasma

J.W.A.M. Gielen, M.C.M. Sanden, van de, W.M.M. Kessels, D.C. Schram

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Abstract

Diamondlike amorphous hydrogenated carbon is deposited from an expanding thermal argon/acetylene plasma. It is observed that the film quality improves with increasing deposition rate. To obtain the best material quality the admixed acetylene flow has to be of comparable magnitude as the argon ion flow from the plasma source (critical loading). A new method to determine the ion density in an argon/acetylene plasma, by probe measurements, is presented. They reveal that the deposition during critical loading is governed by radicals. It is suggested that acetylene is dissociated once and that the C2H radical is formed dominantly.
Original languageEnglish
Title of host publicationThin films: stresses and mechanical properties VI : symposium held April 8 - 12, 1996, San Francisco, California, U.S.A.
EditorsW.W. Gerberich
Pages287-292
DOIs
Publication statusPublished - 1997
EventThin Films: Stresses and Mechanical Properties VI, April 8-12, 1996, San Francisco, CA, USA - San Francisco, CA, United States
Duration: 8 Apr 199612 Apr 1996

Publication series

NameMaterials Research Society Symposium Proceedings
Volume436
ISSN (Print)0272-9172

Conference

ConferenceThin Films: Stresses and Mechanical Properties VI, April 8-12, 1996, San Francisco, CA, USA
CountryUnited States
CitySan Francisco, CA
Period8/04/9612/04/96
OtherSymposium held at the 1996 MRS Spring Meeting

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